PVD (Physical Vapor Deposition) stands for the physical deposition of thin layers from the vapor phase. This process produces layers with a high proportion of covalent bonds of the layer atoms. Properties such as hardness and thermal and chemical stability are significantly enhanced by the PVD coating of precision tools and high-quality components. At the same time, properties such as the coefficient of friction and the tendencies to jam, clog, stick, corrode and oxidize are significantly reduced. Our high-tech coatings have been used in all sectors of industry since 1988.

PACVD (Plasma Assisted Chemical Vapor Deposition) is a development of the CVD process and combines the advantages of both the PVD and the CVD process. In the PACVD process, the coating is deposited by a chemical reaction from the gas phase at temperatures below 180°C with a specific plasma support.